Home - News RSS feed - Technology for purifying nanodispersed silicon dioxide patented by Lobachevsky University researchers

Scientists from the Engineering Chemistry Laboratory at the UNN Research Institute of Chemistry have developed a method for deep purification of silicon dioxide nanopowder intended for use in microelectronics. They have also created an approach to controlling the properties of these nanoparticles. The innovation allows producing particles with specific size and shape, high uniformity, stability, and low impurity content. These properties are crucial for application of such nanoparticles in microchip manufacturing.

"The field of our invention is the purification of amorphous silicon dioxide synthesised using the Stöber method. It is intended for chemical mechanical polishing (CMP) of semiconductor wafers and in processes requiring high-purity abrasive nanomaterials," explained Ksenia Otvagina, the project leader and researcher at the Engineering Chemistry Laboratory.

This research is part of a project to develop polishing suspensions for microelectronics. UNN scientists have designed a production line and specifications for manufacturing the product, resulting in a stable suspension that is being tested by an industry partner. Polishing suspensions enable precise surface treatment with sub-nanometer accuracy and are essential for CMP processes. Due to supply constraints, there is a critical need to develop domestic alternatives comparable to foreign products.

"The quality of wafer processing directly depends on the size, shape, and uniformity of nanoparticles, which affects the reliability and performance of future electronic devices. Developing domestic materials with controlled characteristics is very important for advancing Russian microelectronics and reducing dependence on foreign suppliers," emphasisedKsenia Otvagina.

"Creating domestic components for microelectronics is a key national priority. The patented technology demonstrates how university research addresses current challenges and industry needs. Our goal is to achieve a full cycle from fundamental research to mass implementation. The successful scaling of the process and collaboration with an industry partner confirm that we are on the right track," noted Oleg Trofimov, Rector of UNN.

The research has been conducted by Lobachevsky University scientists since 2024 as part of the "New Materials for Microelectronics" strategic project under the "Priority 2030" federal programme. The project is currently at the pilot technological development stage. The research phase related to selecting the composition and synthesis conditions has been largely completed, and the focus is now on verifying the technology's stability and testing materials with an industry partner.